The integrable hierarchy constructed from a pair of KdV-type hierarchies and its associatedW algebra

For any two arbitrary positive integers n and m, using them ^th KdV hierarchy and the (n+m)^th KdV hierarchy as building blocks, we are able to construct another integrable hierarchy (referred to as the (n, m)^th KdV hierarchy). TheW-algebra associated to the second Hamiltonian structure of the (n, m)^th KdV hierarchy (calledW(n, m) algebra) is isomorphic via a Miura map to the direct sum of aW _m -algebra, aW _n+m -algebra and an additionalU(1) current algebra. In turn, from the latter, we can always construct a representation of aW -algebra.     

Classification of (2,2)-stable unfoldings of map germs with codimensions ≤ 4

In this paper we classify (2,2)-stable unfoldings of map germs with codimensions 4 by means of the algorithm given in [4] by Wassermann.     

氧乙烯基对胶团化过程热力学函数的影响

利用表面张力法测定了各种条件下C_8H_(17)(OC_2H_4)_n-SO_4Na(C_8E_nS; n=0,1,3)的cmc, 并计算了胶团的反离子结合度、胶团化过程中的自由能(ΔG°)和熵变(ΔS°)。结果发现: C_8E_nS的cmc随n的增加而下降, 并且下降的幅度逐渐变小; 胶团的反离子结合度也随n的增加而减小; ΔS°随n的增加而增加, 但增加的幅度逐渐变小, 对于离子和非离子表面活性剂都是如此。人们认为这是由于氧乙烯基(EO)具有亲水和疏水二重性, 随着EO数的增加, EO的疏水性相对减弱而亲水能力将相对增加所致。EO的这个特点, 是它在表面活性剂分子中具有特殊表现的根本原因。     

一种基于形成杂多核络合物的荧光增敏效应的研究 Ⅲ.锰(Ⅱ)、钴(Ⅱ)的混合荧光增敏及其连续测定

本文研究了Mn~(2+)和Co~(2+)对7-(8-羟基-3,6-二磺基萘偶氮)-8-羟基喹啉-5-磺酸-硼砂反应体系的混合荧光增敏作用。实验条件下,荧光增敏强度满足线性加和关系的范围是:Mn~(2+)浓度0～2.9×10~(-7)mol/L;Co~(2+)浓度0～8.8×10~(-7)mol/L;总浓度不超过1.0×10~(-6)mol/L。检出限量为Mn~(2+)4.5×10~(-9)mol/L和Co~(2+)1.4×10~(-8)mol/L。实现了Mn~(2+)和Co~(2+)的连续测定。     

选择脱卤还原反应的研究

Ramasamy、Osuka等用NaHTe/EtOH研究了二卤代物的脱邻二溴、偕二溴反应和α-溴代羰基化合物的脱卤还原反应,我们选择结构不同的卤代物以NaHTe还原,发现在水介质和催化量碲代替计算量碲时也能顺利地进行这类反应,其反应条件温和,产率高,是有机官能团转化的好方法。     

An unusual mixed-valence Cu(I)-Cu(II) 3-D framework

The reaction of Cu(CH(3)CN)(4)ClO(4) with 2-pyridylacrylic acid (2-HPYA) affords an unusual mixed-valence Cu(I)-Cu(II) 3-D framework ([Cu(II)(2-PYA)(2)](3).[Cu(I)(2-PYA)](2).(H2O)(2))n (1) with a novel topology which features Cu(II) dimeric units (or paddle-wheel unit). The almost perpendicular coordinating direction between the N atom of pyridyl and the O atom of carboxylate groups may be responsible for the formation of such a novel network.